Ziqi
Zhang‡
ab,
Qiong
Wu‡
ab,
Dan
Deng
*a,
Sihua
Wu
ab,
Rui
Sun
c,
Jie
Min
c,
Jianqi
Zhang
a and
Zhixiang
Wei
*ab
aCAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, China. E-mail: dengd@nanoctr.cn; weizx@nanoctr.cn
bUniversity of Chinese Academy of Science, Beijing, 100049, China
cThe Institute for Advanced Studies, Wuhan University, Wuhan 430072, China
First published on 27th August 2020
Post-treatment is a widely used approache to improve the device performance of all-small-molecule organic solar cells (ASM-OSCs), which leads to a balanced miscibility and crystallinity of the active layers. However, compared to as-cast devices, their efficiency is notably improved but normally accompanied with big open circuit voltage (Voc) loss after thermal annealing (TA) or solvent vapor annealing (SVA), which limits further breakthrough of the device performance and lacks investigation. In this manuscript, we design a novel molecule BSCl with a deep HOMO energy level and a good molecular assembling ability. Using IDIC-4Cl as an acceptor and combining TA and SVA, a PCE of 13.03% was achieved. The device improvements, film formation and Voc variations during the post-treatment methods were deeply investigated via Grazing incidence wide angle X-ray scattering and energy loss characterization. The characterization results illustrated that the decreased Voc during TA should be mainly due to the decreased ECT accompanied with a larger ΔVnon-rad, which is further ascribed to their upshifts in the HOMO energy levels. The Voc could be partly recovered after further SVA. Our results signify the importance of the shifts in the band-gap, ECT, and ultimately the energy levels during the post-treatment methods, providing useful guidance on high efficiency molecule optimization and a deep understanding on the energy loss investigation and film formation via device optimization.
Post-treatment for device optimization is an efficient approach to improve the device performance of ASM-OSCs, by achieving a delicately balanced miscibility and crystallinity. However, compared to as-cast devices, the open circuit voltage (Voc) is notably reduced by thermal annealing (TA) or solvent vapor annealing (SVA), which limits further breakthrough of the PCE.15,17–19 The plausible reasons for energy loss deduced by researchers in fullerene-based OSCs are the improved crystalline order for both donors and acceptors in a mixed region and narrowed quasi-Fermi level splitting which determine the voltage output of the devices.20–22 For example, in a highly amorphous polymer and fullerene bulk heterojunction blends, the mobility enhancement induced non-geminate charge carrier recombination is the reason for the decline of Voc in SVA devices.21 In fullerene-based small OSCs, both the radiative recombination and non-radiative recombination are increased after SVA, although a suppressed geminate recombination is observed.20 However, different from fullerene-based systems, both donors and acceptors are crystalline small molecules in ASM-OSCs; on the other hand, their Voc loss is mainly because of TA, and SVA sometimes even can recover some voltage. Hence, a deep investigation of the Voc variation during post-treatment is of significant importance for further exploring high-efficiency ASM-OSCs. Recently, by adjusting the branching points in alkyl terminal chains, we have achieved a balanced miscibility and phase separation. Using IDIC-4Cl (Fig. 1a) as an acceptor, a PCE of 12.4% for BSCl-C2 (the branching point at the second position) was achieved.23
![]() | ||
Fig. 1 (a) Molecular structures of BSCl, BSCl-C2, and IDIC-4Cl. (b) UV-vis absorption spectra of small molecules in solution (s) and film (f) states. (c) Schematic energy diagrams measured by CV. |
In this manuscript, based on our previously reported molecular backbone and molecule BSCl-C2,6,23–25 we introduced linear chains to the end-capped group to further enhance the molecular packing ability, and synthesized a new A–π–D–π–A type small-molecule donor, named BSCl (Fig. 1a). Using IDIC-4Cl as an acceptor and combining TA and subsequently SVA to improve the fill factor (FF) and the short circuit current (Jsc), a PCE of 13.03% was achieved, which should be among the highest PCEs based on IDIC-systems in ASM-OSCs. However, the Voc declined by ca. 50 mV after TA, and recovered by ca. 20 mV after SVA, both of which are highly consistent with the non-radiative recombination energy loss (ΔVnon-rad, an increment of 42 meV after TA and a decrement 20 meV after SVA). The ΔVnon-rad is attributed to different ECT which is in correspondence with their HOMO energy level shifts induced by the interfacial dipole and band-bending energies varying during the morphology change. Our results would deepen the understanding of energy loss and device parameter variations via device optimization.
Post-treatment | V oc (V) | J sc (mA cm−2) | FF (%) | PCE (%) | J calsc (mA cm−2) | μ h (cm2 V−1 s−1) | μ e (cm2 V−1 s−1) |
---|---|---|---|---|---|---|---|
as-cast | 0.900 (0.903 ± 0.0058) | 7.7 (7.5 ± 0.35) | 33.9 (34.4 ± 1.50) | 2.35 (2.32 ± 0.024) | 7.5 | 2.8 × 10−5 | 5.2 × 10−6 |
SVA | 0.929 (0.925 ± 0.0028) | 12.9 (12.0 ± 0.74) | 45.6 (46.0 ± 1.44) | 5.45 (5.10 ± 0.39) | 12.9 | 1.1 × 10−5 | 6.2 × 10−6 |
TA | 0.845 (0.844 ± 0.0087) | 19.1 (19.4 ± 0.17) | 65.6 (63.0 ± 1.57) | 10.57 (10.29 ± 0.206) | 18.2 | 3.0 × 10−5 | 1.8 × 10−5 |
TA + SVA | 0.865 (0.864 ± 0.0043) | 21.5 (21.3 ± 0.37) | 70.0 (69.9 ± 0.86) | 13.03 (12.85 ± 0.178) | 20.3 | 5.4 × 10−5 | 7.7 × 10−5 |
The external quantum efficiency (EQE) (Fig. 2b) was measured to explicate the discrepancy in the Jsc values of the devices. The Jsc values calculated from the integration of the EQE spectra fitted well with the Jsc values from the J–V curves. According to the EQE spectra, SVA treatment mainly increased the quantum efficiency from 650 to 800 nm, which is attributed to the acceptor's absorption. However, the EQE increment brought by TA treatment ranged throughout the spectra from 430 nm to 800 nm. Thus, we came to the conclusion that SVA treatment mainly affected the photon utilization of the acceptors, while TA treatment and SVA after TA treatment influenced both the photon utilization of the donor and the acceptor. We would further analyse this in the morphology section. It should be mentioned that the stability of our devices needs to be improved in the future on the basis of the stability test (Fig S3, ESI†).
Light-intensity-dependent Voc was determined to identify the charge recombination mechanism under open circuit conditions. Voc and its corresponding incident light intensity (Plight) could be fitted by the relationship of Voc ∝ nkT/qln(Plight), where k is the Boltzmann constant, T is the temperature in Kelvin, and q is the elementary charge.26,27 Generally, if n is close to 1, then bimolecular recombination is the dominant process. If n is close to 2, trap assisted recombination becomes the main process. As shown in Fig. 2c, the slopes of the as-cast, SVA, TA, and TA + SVA devices were 1.02kT/q, 1.16kT/q, 1.07kT/q, and 1.12kT/q, respectively. Consequently, the recombination mechanism with different post-treatment methods should be bimolecular recombination dominant. It should be mentioned that, in comparison to TA, a tiny stronger dependence of Voc on the light intensity for SVA treatment was seen, implying that SVA would increase the ratio of monomolecular recombination (SRH) processes.
To further evaluate the conversion of the absorbed photons into free charges, we measured the dependence of the photocurrent density (Jph) versus the effective voltage (Veff).28Jph is defined as JL–JD, where JL and JD are the current densities under illumination and dark conditions, respectively. Veff is defined as V0–V, where V0 is the voltage at Jph = 0 and V is the applied voltage. At low Veff values, the photocurrent increases linearly with the voltage, while at high Veff values, generally, Jph tends to saturate when the charge carriers rapidly move towards the electrodes with minimum recombination. The dissociation probability P(E, T) was estimated by calculating the Jph/Jsat, where Jph is the photocurrent density under short-circuit conditions, and Jsat is the saturated photocurrent density. Fig. 2d shows the Jph–Veff curves with different post-treatment methods. For the as-cast and SVA devices, the Jsc is not saturated even at Veff = 3 V, indicating their inefficient exciton dissociation. For the TA and TA + SVA devices, the P(E, T) showed a high value of 0.96 and 0.94, respectively. Consequently, a high FF and Jsc was observed after the TA and TA + SVA treatment. The higher P(E, T) for TA is deduced to be the result of its higher driving force as analyzed in the following section.
![]() | ||
Fig. 3 (a) 2D GIWAXS graphs of the BSCl:IDIC-4Cl blend films with different post-treatment methods. (b) Corresponding curves of 2D GIWAXS patterns. (c) TEM images. |
Considering different post-treatment methods for BSCl, as shown in the out of plane (OP) direction, the as-cast films exhibited lamellar peaks of (100) and (200), while the SVA films only showed a lamellar peak of (100); however, the TA and TA + SVA films presented higher-order diffraction peaks of (300) and (400). Furthermore, the calculated crystal coherence lengths (CCLs) of the donor crystallites of (100) in the OP direction of the blend films came out to be 8.98, 8.57, 9.59, and 9.47 nm for the as-cast, SVA, TA, and TA + SVA films, respectively.29 Consequently, in this work, both of the above phenomena indicated a slightly decreased donor packing ability for the SVA but stronger molecular crystallinity after TA treatment. Hence, following SVA after TA would further increase the molecular miscibility between the donors and acceptors. The thermal sensitivity of the donors could be further evidenced by the following HOMO energy level shifts characterized by UPS.
As for IDIC-4Cl, after thermal annealing, a strong lamellar peak of q = 0.38 Å−1 emerged especially in the in plane (IP) direction, as deduced from its pristine films, which should be attributed to its ordered arrangement of alky chains. The emergence of the peak demonstrates better molecular packing ability of IDIC-4Cl after heating. The CCLs of the TA and TA + SVA films calculated from the q = 0.38 Å−1 peak are 13.5 and 13.8 nm, respectively, indicating that SVA after TA would further facilitate the acceptor assembly. The lamellar peak of (010) in the OP direction for the as-cast, SVA, TA, and TA + SVA films was located at qz =1.725, 1.725, 1.723 and 1.733 Å−1, and their corresponding d-spacing was 3.642, 3.647, 3.642 and 3.626 Å, respectively. The smaller π–π stacking distance of the film with SVA treatment after TA further confirms its better acceptor packing.
Based on the above analysis, thermal annealing would be beneficial for the crystalline order of both the donor and acceptor, while SVA is conducive to the aggregation of the acceptor but weakens the aggregation of the donor. These results are in good agreement with the transmission electron microscopy (TEM) images (Fig. 3c). Compared to the as cast film, TA leads to less dark discontinuous regions and much brighter and denser light regions with emerging thin fibers, confirming its better crystalline order. Following SVA after TA, although the fiber is less obvious, the film exhibits a more interpenetrating network with a phase separation of ca. 20 nm, further validating the SVA function of adjusting the miscibility through the disparity packing ability of the donor and the acceptor.
After SVA, compared to the as cast film, the hole mobility slightly decreased and the electron mobility showed a negligible improvement, and hence, the big disparity between the hole and electron mobility is alleviated, leading to an improvement in FF. We deduced that the mobility variation is due to the phenomenon that SVA is against the donor ordered packing but conducive to the acceptor assembly. This should also explain the increased Jsc for SVA mainly in the range of the acceptor's absorption spectrum, as seen in the EQE image (Fig. 2b). Compared to SVA, TA shows a more influential effect on the mobility, and both the hole and electron mobility increased, which is consistent with the fact that the crystalline order of both the donor and acceptor is improved after TA. Consequently, the FF is further enhanced, and the Jsc is improved in the region of both the donor and acceptor absorption spectrum. Although the hole mobility of the donor was not as high as what some studies reported,31,32 the balanced hole and electron mobilities contribute to the enhanced efficiency, which is due to its suppressed charge recombination. Furthermore, in the SVA and TA treated devices, the hole mobility was enhanced to 5.4 × 10−5 cm2 V−1 s−1 and the electron mobility was enhanced to 7.7 × 10−5 cm2 V−1 s−1, and the FF was enhanced to 70% and a maximum EQE was achieved of ca. 78% with a Jsc of 21.5 mA cm−2. Note that the mobility variation with post-treatment is in agreement with the intercept variation of the space-charge limited region of the Veff–Jph image, which also acts as an indicator of the mobility (Fig. 2d).
As shown in the summarized data of energy loss in Table 2 and Fig. 5a, TA slightly influences the Eg but significantly affects the ECT. Compared to the device based on as cast, the Eg is smaller by ca. 30 meV after TA but the ECT is downshifted by ca. 106 meV. However, SVA showed more negligible effects, and further SVA after TA even compensated the variations. Consequently, the driving force for exciton dissociation with different post treatment methods is TA (0.264 eV) > TA + SVA (0.231 eV)> as cast (0.191 eV) > SVA (0.183 eV), and this trend is quite in agreement with that of the exciton dissociation efficiency TA(0.96) > TA + SVA (0.94) ≫ as cast and SVA (Jph unsaturated at Veff = 3 V).
Post-treatment | E g (eV) | qV oc (eV) | E CT (eV) | qV radoc (eV) | qV loss (eV) | E g − ECT (eV) | qΔVrad (eV) | qΔVnon-rad (eV) |
---|---|---|---|---|---|---|---|---|
As-cast | 1.623 | 0.900 | 1.432 | 1.252 | 0.723 | 0.191 | 0.180 | 0.352 |
SVA | 1.608 | 0.929 | 1.425 | 1.245 | 0.679 | 0.183 | 0.180 | 0.316 |
TA | 1.590 | 0.845 | 1.326 | 1.239 | 0.745 | 0.264 | 0.087 | 0.394 |
TA + SVA | 1.586 | 0.865 | 1.355 | 1.238 | 0.721 | 0.231 | 0.117 | 0.373 |
![]() | ||
Fig. 5 (a) Energy loss schematic diagram with different post-treatment methods and (b) UPS of films with different post-treatment methods. |
Another obvious increased energy loss during the post-treatment is non-radiative recombination loss (ΔVnon-rad). The ΔVnon-rad is 0.352, 0.316, 0.394 and 0.373 eV for the as cast, SVA, TA, and TA + SVA devices, respectively. Consequently, TA would increase the ΔVnon-rad, while the SVA would decrease the ΔVnon-rad. More importantly, the variation in the trend of the ΔVnon-rad is in good agreement with the trend of the reorganization energy (λ) and the opposite trend of ECT. This abnormal phenomena could be explained well by the band-gap law. The lower the ECT the larger the reorganization energy (λ) of the CT states, and the easier for the CT state to decay to the ground state by energy transfer via vibrational coupling.34 In addition, recent work reported by Nelson demonstrated that a higher ECT (ca. 0.1–0.2 eV less than Eg), would lead to hybridization (stronger electronic coupling) between the first excited state and the charge transfer state, resulting in strong suppression of ΔVnon-rad.35 Hence, a higher ECT and a narrower λ induced by SVA after TA would further decrease the ΔVnon-rad leading to a recovered Voc.
Based on the analysis above, the energy loss is 0.723 eV for the as cast films with a Voc of 0.90 V, 0.679 eV for the SVA films with a Voc of 0.929V, 0.745 eV for TA with a Voc of 0.845 V, and 0.721 eV for TA + SVA with a Voc of 0.865 V. It is easily found that the energy loss for the as cast and TA + SVA films is the same, but the Voc shows a difference of 55 mV, and this should be due to the shifts in the Eg. In fact, we calculated the energy loss of the devices based on the IDIC systems from the band-gap calculated from the onset of the absorption spectrum; the energy loss in our work is among the lowest group.23 However, the band-gap calculated from the intersection of the absorption spectrum and the EL spectrum is much larger. Thus, to obtain the relative accurate energy loss, the impact of post-treatment on the change of the band-gap should be considered.
Footnotes |
† Electronic supplementary information (ESI) available. See DOI: 10.1039/d0tc03043k |
‡ Ziqi Zhang and Qiong Wu contributed the work equally. |
This journal is © The Royal Society of Chemistry 2020 |