From the journal:

Chemical Communications

Crystal phase-directed growth of rutile/anatase TiO2 heterojunctions via in situ stepwise chemical bath deposition below 80 °C

Kazuhiro Manseki,*a   Shinapol Toranathumkul,a   Satoka Wada,a   Naohide Nagaya,a   Daisuke Takemoto,a   Ryoma Yasudaa  and  Takashi Sugiuraa  

* Corresponding authors

a The Graduate School of Natural Science and Technology, Gifu University, 1-1 Yanagido, Gifu, Japan
E-mail: manseki.kazuhiro.k4@f.gifu-u.ac.jp

Abstract

The fabrication of hierarchical TiO2 phase junctions, such as rutile/anatase heterostructured films, via a low-temperature crystallization, has long been a challenge due to the lack of effective reaction strategies. In this study, we developed a temperature-gradient double-stage chemical bath deposition (CBD) method to produce rutile/anatase TiO2 thin films.

Graphical abstract: Crystal phase-directed growth of rutile/anatase TiO2 heterojunctions via in situ stepwise chemical bath deposition below 80 °C

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Article information

DOI
https://doi.org/10.1039/D5CC03571F
Article type
Communication
Submitted
25 Jun 2025
Accepted
28 Jul 2025
First published
29 Jul 2025

Chem. Commun., 2025, Advance Article

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Crystal phase-directed growth of rutile/anatase TiO2 heterojunctions via in situ stepwise chemical bath deposition below 80 °C

K. Manseki, S. Toranathumkul, S. Wada, N. Nagaya, D. Takemoto, R. Yasuda and T. Sugiura, Chem. Commun., 2025, Advance Article , DOI: 10.1039/D5CC03571F

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